APPARATUS FOR PROCESSING SUBSTRATE

PURPOSE: A substrate processing apparatus is provided to load/unload a substrate by using a robot arm, a holder, and a roller. CONSTITUTION: A chamber(111) is formed in a main body(110). Rollers(130) are rotatably arranged in the main body. The rollers are located in the chamber. A substrate(50) is...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KANG, HO YOUNG, CHO, BYUNG HO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE: A substrate processing apparatus is provided to load/unload a substrate by using a robot arm, a holder, and a roller. CONSTITUTION: A chamber(111) is formed in a main body(110). Rollers(130) are rotatably arranged in the main body. The rollers are located in the chamber. A substrate(50) is supported by a holder(120). The holder is supported and transferred by a robot arm(60). The holder is supported by the rollers. Heaters(140) are supported in the main body. The heaters are located in the chamber. Heaters generate heat for processing a substrate.