VACUUM CHUCK

PURPOSE: A vacuum chuck is provided to prevent arcing discharge at the upper side of a base by including a porous plate which is an insulator. CONSTITUTION: A processed substrate is settled on the upper side of a porous plate(10). A vacuum hole supports the processed substrate and lifts up the proce...

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Bibliographische Detailangaben
1. Verfasser:	KANG, CHANG SU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE: A vacuum chuck is provided to prevent arcing discharge at the upper side of a base by including a porous plate which is an insulator. CONSTITUTION: A processed substrate is settled on the upper side of a porous plate(10). A vacuum hole supports the processed substrate and lifts up the processed substrate. A base(20) is connected to the vacuum hole. The base is arranged at the bottom of a processing chamber. A coating unit(30) protects the exterior surface of the base from plasma. A silicon bonding unit is laminated between the base and the porous plate and combines the base and the porous plate. The porous plate and the coating unit are comprised of insulated ceramic material.