COATING DEVICE AND COATING METHOD

PURPOSE: A coating apparatus and a coating method are provided to stably produce a coated substrate without damaging a slit nozzle and/or a substrate by foreign materials. CONSTITUTION: A coating method includes the following: a sheet-shaped substrate(10) is scanned by relatively moving a coating ap...

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Bibliographische Detailangaben
Hauptverfasser:	KONDO TAKASHI, KUGII TOYOKAZU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING NOZZLES PERFORMING OPERATIONS PHYSICS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE: A coating apparatus and a coating method are provided to stably produce a coated substrate without damaging a slit nozzle and/or a substrate by foreign materials. CONSTITUTION: A coating method includes the following: a sheet-shaped substrate(10) is scanned by relatively moving a coating apparatus(1) against the substrate; coating liquid is discharged on the surface of the substrate to form a coating film. A discharging process includes a process in which foreign materials on the substrate toward the upstream of scanning direction is detected. The detecting process includes the following: the surface of the substrate is irradiated with laser; the penetrated laser is received; air currents under the laser penetrate area is shielded.