PHOTORESISTS AND METHODS FOR USE THEREOF

PURPOSE: A method for manufacturing an ion-implanted semiconductor substrate, the substrate, and a photoresist relief image forming method, and a photoresist composition are provided to secure superior resolution and adhesion to a SiON layer and an inorganic substrate layer. CONSTITUTION: A method f...

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Hauptverfasser: CAPORALE STEFAN J, POHLERS GERHARD
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creator CAPORALE STEFAN J
POHLERS GERHARD
description PURPOSE: A method for manufacturing an ion-implanted semiconductor substrate, the substrate, and a photoresist relief image forming method, and a photoresist composition are provided to secure superior resolution and adhesion to a SiON layer and an inorganic substrate layer. CONSTITUTION: A method for manufacturing an ion-implanted semiconductor substrate includes the following: a chemically amplified positive-active photoresist composition-based relief image is coated on a semiconductor substrate; and ions are implanted on the substrate. The composition includes a resin, a photo-active component, and a multi-keto component. The multi-keto component is a resin, and the resin includes a photoacid-labile group. The multi-keto component includes at least two adjacent non-cyclic keto groups.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title PHOTORESISTS AND METHODS FOR USE THEREOF
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