PHOTORESISTS AND METHODS FOR USE THEREOF
PURPOSE: A method for manufacturing an ion-implanted semiconductor substrate, the substrate, and a photoresist relief image forming method, and a photoresist composition are provided to secure superior resolution and adhesion to a SiON layer and an inorganic substrate layer. CONSTITUTION: A method f...
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creator | CAPORALE STEFAN J POHLERS GERHARD |
description | PURPOSE: A method for manufacturing an ion-implanted semiconductor substrate, the substrate, and a photoresist relief image forming method, and a photoresist composition are provided to secure superior resolution and adhesion to a SiON layer and an inorganic substrate layer. CONSTITUTION: A method for manufacturing an ion-implanted semiconductor substrate includes the following: a chemically amplified positive-active photoresist composition-based relief image is coated on a semiconductor substrate; and ions are implanted on the substrate. The composition includes a resin, a photo-active component, and a multi-keto component. The multi-keto component is a resin, and the resin includes a photoacid-labile group. The multi-keto component includes at least two adjacent non-cyclic keto groups. |
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CONSTITUTION: A method for manufacturing an ion-implanted semiconductor substrate includes the following: a chemically amplified positive-active photoresist composition-based relief image is coated on a semiconductor substrate; and ions are implanted on the substrate. The composition includes a resin, a photo-active component, and a multi-keto component. The multi-keto component is a resin, and the resin includes a photoacid-labile group. 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CONSTITUTION: A method for manufacturing an ion-implanted semiconductor substrate includes the following: a chemically amplified positive-active photoresist composition-based relief image is coated on a semiconductor substrate; and ions are implanted on the substrate. The composition includes a resin, a photo-active component, and a multi-keto component. The multi-keto component is a resin, and the resin includes a photoacid-labile group. 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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | PHOTORESISTS AND METHODS FOR USE THEREOF |
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