TREATING DEVICE OF INDUCTIVELY COUPLED PLASMA AND ITS ANTENNA

PURPOSE: An inductively coupled plasma antenna and an inductively coupled plasma processing apparatus having the same are provided to easily process a large area by obtaining uniform plasma density distribution with high density having no damage thereto. CONSTITUTION: An inductively coupled plasma a...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, JEONG WOON, JOO, JONG RYANG, AN, KYOUNG JOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANTENNAS, i.e. RADIO AERIALS BASIC ELECTRIC ELEMENTS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	PURPOSE: An inductively coupled plasma antenna and an inductively coupled plasma processing apparatus having the same are provided to easily process a large area by obtaining uniform plasma density distribution with high density having no damage thereto. CONSTITUTION: An inductively coupled plasma antenna is composed of a common electrode(35) and a plurality of helical coils(39). RF power is applied to the common electrode. The plurality of helical coils forms a magnetic field inside a plasma processing chamber by being applied with the RF power from the common electrode. The common electrode includes a center electrode(36) and a plurality of branch electrodes(37). A center electrode is arranged in an upper center portion of a dielectric. The center electrode is electrically connected to a radio frequency power supply unit. The plurality of branch electrodes is branched to the circumference of the center electrode.