VACUUM PROCESSING APPARATUS

PURPOSE: A vacuum processing device is provided to minimize thermal deformation of a seal plate by reducing a temperature variation between the seal plate and a processing space of a chamber body. CONSTITUTION: A chamber body(110) has a processing space for a substrate(10). A substrate support unit(...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, JAE GEUN, KIM, KEON HA, ANN, SUNG IL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	PURPOSE: A vacuum processing device is provided to minimize thermal deformation of a seal plate by reducing a temperature variation between the seal plate and a processing space of a chamber body. CONSTITUTION: A chamber body(110) has a processing space for a substrate(10). A substrate support unit(101) is installed on the inner lower side of the chamber body to support the substrate. A top lead(120) has a structure to open and close an upper opening of the chamber body. A gas spray unit(102) supplies gas from the outside to the processing space. A seal plate(130) is combined with the lower side of the top lead.