PHOTOELECTRIC ELEMENT AND MANUFACTURING METHOD OF THE SAME

PURPOSE: A photoelectric device and a manufacturing method thereof are provided to reduce an amount of lost charges in a moving process by preventing crystal defects through a photoelectric layer formed on a buffer layer. CONSTITUTION: A first electrode(120) has transmittance and conductivity. The f...

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Bibliographische Detailangaben
Hauptverfasser: PARK, HAN SUN, MIN, SOON YOUNG
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A photoelectric device and a manufacturing method thereof are provided to reduce an amount of lost charges in a moving process by preventing crystal defects through a photoelectric layer formed on a buffer layer. CONSTITUTION: A first electrode(120) has transmittance and conductivity. The first electrode includes an uneven layer(121) and a buffer layer(122). A photoelectric layer(130) comprises a plurality of semiconductor layers on the first electrode. The photoelectric layer generates electron-hole pairs by absorbing light passing through the substrate and the first electrode. A second electrode(140) has conductivity on the photoelectric layer.