APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to shorten substrate processing time by simultaneously loading and unloading a substrate. CONSTITUTION: A horizontal transfer unit(100) for loading receives a substrate through a loading unit formed in one side...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JEON, YONG CHIL, YUN, GEUN SIK
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:PURPOSE: A substrate processing apparatus and a substrate processing method are provided to shorten substrate processing time by simultaneously loading and unloading a substrate. CONSTITUTION: A horizontal transfer unit(100) for loading receives a substrate through a loading unit formed in one side of a frame(1). A horizontal transfer unit(100') for unloading discharges the completely processed substrate from a substrate processing unit(400) to the outside through an unloading unit. A vertical transfer unit(200) for loading vertically moves between the horizontal transfer unit for the loading and the substrate processing unit. A vertical transfer unit(200') for unloading vertically moves between the substrate processing unit and the horizontal transfer unit for the unloading. A substrate transfer unit(300) for loading includes a roller which receives the substrate from the vertical transfer unit for the loading and transfers the substrate to the substrate processing unit.