BEAM FOCUSING APPARATUS AND BEAM FOCUSING METHOD

PURPOSE: A beam focusing apparatus and a beam focusing method are provided to enable the focus of incident beam by including two metal nano blocks placed on a dielectric layer. CONSTITUTION: A beam focusing apparatus comprises a dielectric layer(10), a first metal nano block(12), and a second metal...

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Bibliographische Detailangaben
Hauptverfasser: PARK, SEUNG HAN, KIM, JAE HYUK, AHN, HONG GYU, JEONG, EUN HEE
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A beam focusing apparatus and a beam focusing method are provided to enable the focus of incident beam by including two metal nano blocks placed on a dielectric layer. CONSTITUTION: A beam focusing apparatus comprises a dielectric layer(10), a first metal nano block(12), and a second metal nano block(14). The first metal nano block and the second metal nano block are separated on the dielectric layer. A dielectric layer can be formed of glass and SiO2 or Si3N4. The metal nano block can be formed of one selected from a group consisting of the Au, Ag, Pt, Cu, Al, Ti, and Ni.