HEAT-TREATMENT APPARATUS

PURPOSE: A heat treatment apparatus is provided to discharge air through a return passage by heat treating the air flowing in/out to/from a heat treatment furnace, thereby preventing leakage of sublimation materials. CONSTITUTION: A shutter member closes an entrance. A plurality of contact members i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TODA YOJI, UEDA TAKESHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	PURPOSE: A heat treatment apparatus is provided to discharge air through a return passage by heat treating the air flowing in/out to/from a heat treatment furnace, thereby preventing leakage of sublimation materials. CONSTITUTION: A shutter member closes an entrance. A plurality of contact members is installed on the shutter member. The contact members are welded on an edge part of the entrance. An elastic member is installed on the shutter member. A duct(27) is installed an opening part of the entrance of a heat treatment furnace(20). A plurality of air inlets is formed between the edge part of the entrance of the heat treatment furnace and the shutter member. Air flowing through the air inlets is discharged to an external air passage pipe by heat treating the air.