LIGHT EMITTING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING

The light emitting semiconductor device (1) of the present invention is made of nitrides of group III metals and comprises a layer structure comprising an n-type semiconductor layer (2), a p-type semiconductor layer (3), an active region (4) between the n-type semiconductor layer and the p-type semi...

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Bibliographische Detailangaben
Hauptverfasser:	ODNOBLYUDOV MAXIM A, MULOT MIKAEL, BOUGROV VLADISLAV E
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The light emitting semiconductor device (1) of the present invention is made of nitrides of group III metals and comprises a layer structure comprising an n-type semiconductor layer (2), a p-type semiconductor layer (3), an active region (4) between the n-type semiconductor layer and the p-type semiconductor layer. The layer structure has a contact surface (5) defined by one of the n-type and p-type semiconductor layers and comprises further a reflective contact structure (6) attached to the contact surface. According to the present invention, the reflective contact structure (6) comprises: a first transparent conductive oxide (TCO) contact layer (13), having a poly- crystalline structure, attached to the contact surface (5) of the layer structure; a second transparent conductive oxide (TCO) contact layer (14) having an amorphous structure; and a metallic reflective layer (15) attached to the second TCO layer.