THE METHOD OF MAGNESIUM OXIDE NANOROD COATED WITH TIN OXIDE AND MAGNESIUM OXIDE NANOROD COATED WITH TIN OXIDE PREPARED THEREBY

THE METHOD OF MAGNESIUM OXIDE NANOROD COATED WITH TIN OXIDE AND MAGNESIUM OXIDE NANOROD COATED WITH TIN OXIDE PREPARED THEREBY

PURPOSE: A tin oxide coated magnesium oxide nanorod and a manufacturing method thereof are provided to improve lifetime and reliability of the tin oxide nanorods by coating with titanium oxide. CONSTITUTION: A manufacturing method of tin oxide coated magnesium oxide nanorod comprises the following s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JIN, CHANG HYUN, BAEK, KYUNG JOON, LEE, CHONG MU, KIM, HYUN SU
Format: Patent
Sprache:eng ; kor
Schlagworte:
CHEMISTRY
COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS
INORGANIC CHEMISTRY
MANUFACTURE OR TREATMENT THEREOF
METALLURGY
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
PERFORMING OPERATIONS
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE: A tin oxide coated magnesium oxide nanorod and a manufacturing method thereof are provided to improve lifetime and reliability of the tin oxide nanorods by coating with titanium oxide. CONSTITUTION: A manufacturing method of tin oxide coated magnesium oxide nanorod comprises the following steps: forming magnesium oxide nanorod by thermal vaporizing magnesium nitride(Mg3N2) powder; coating magnesium oxide with tin oxide; and heat-treating the magnesium oxide nanorod in reducing atmosphere. The thermal vaporization of the magnesium oxide nanorod formation step uses gold thin film as catalyst. In the titanium oxide coating step, the coating method is selected from the following: sol-gel process, heating, a method using solution, chemical vapor deposition process, laminating method, and sputtering method. The heat-treating temperature in heat-treatment step is 400-700deg.C. The reducing atmosphere of heat-treatment step is produced by N2/3mol% H2 phosphorus mixing gas.