SPUTTERING APPARATUS AND METHOD FOR FORMING TRANSPARENT CONDUCTIVE OXIDE OF LIGHT EMITTING DEVICE

PURPOSE: A sputtering device and method for forming a transparent conductive film of an emitting device is provided to prevent the deterioration of a p-type semiconductor by controlling the influence of plasma. CONSTITUTION: A target receiving part(110) is located in one inner side wall of a chamber...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HUR, WON GOO, KIM, GI BUM, SHIN, YOUNG CHUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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