POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PURPOSE: A positive type photo-sensitive composition is provided to improve electric insulating characteristics and the strength of a hardened material. CONSTITUTION: A positive type photo-sensitive composition includes an alkali-soluble resin, a quinonediazide group containing compound, at least tw...

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Bibliographische Detailangaben
Hauptverfasser:	ISHIKAWA KAORU, ANDO TOMOYUKI, SENZAKI TAKAHIRO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE: A positive type photo-sensitive composition is provided to improve electric insulating characteristics and the strength of a hardened material. CONSTITUTION: A positive type photo-sensitive composition includes an alkali-soluble resin, a quinonediazide group containing compound, at least two alkylesterified amino groups containing compound, an acryl resin, and a solvent. The alkali soluble resin includes a phenolic hydroxyl group. The acryl resin includes a structural unit represented by chemical formula 1 and a structural unit derived from unsaturated carboxylic acid. The mass average molecular weight of the acryl resin is between 20,000 and 50,000. In chemical formula 1, R1 is an alkyl group. R2 is a hydrocarbon group respectively. The p is between 0 and 3.