CAPACITOR AND PROCESS FOR MANUFACTURING CAPACITOR

CAPACITOR AND PROCESS FOR MANUFACTURING CAPACITOR

Disclosed is a capacitor characterized by comprising: a lower electrode layer comprising an electrically conductive metal or a compound of the metal; a first dielectric film formed on the lower electrode layer and comprising ZrO2; a second dielectric film formed on the first dielectric film and comp...

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Hauptverfasser: AKASAKA YASUSHI, ARIKADO TSUNETOSHI, KAITSUKA TAKANOBU, ALBERT CHIN
Format: Patent
Sprache:eng ; kor
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ELECTRICITY
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creator AKASAKA YASUSHI
ARIKADO TSUNETOSHI
KAITSUKA TAKANOBU
ALBERT CHIN
description Disclosed is a capacitor characterized by comprising: a lower electrode layer comprising an electrically conductive metal or a compound of the metal; a first dielectric film formed on the lower electrode layer and comprising ZrO2; a second dielectric film formed on the first dielectric film and comprising a dielectric material comprising a Ti-containing metal oxide; and an upper electrode layer formed on the second dielectric film.
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KAITSUKA TAKANOBU ; ALBERT CHIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20110099797A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2011</creationdate><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>AKASAKA YASUSHI</creatorcontrib><creatorcontrib>ARIKADO TSUNETOSHI</creatorcontrib><creatorcontrib>KAITSUKA TAKANOBU</creatorcontrib><creatorcontrib>ALBERT CHIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AKASAKA YASUSHI</au><au>ARIKADO TSUNETOSHI</au><au>KAITSUKA TAKANOBU</au><au>ALBERT CHIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CAPACITOR AND PROCESS FOR MANUFACTURING CAPACITOR</title><date>2011-09-08</date><risdate>2011</risdate><abstract>Disclosed is a capacitor characterized by comprising: a lower electrode layer comprising an electrically conductive metal or a compound of the metal; a first dielectric film formed on the lower electrode layer and comprising ZrO2; a second dielectric film formed on the first dielectric film and comprising a dielectric material comprising a Ti-containing metal oxide; and an upper electrode layer formed on the second dielectric film.</abstract><oa>free_for_read</oa></addata></record>
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title CAPACITOR AND PROCESS FOR MANUFACTURING CAPACITOR
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