FABRICATION METHOD OF ULTRALOW REFRACTIVE INDEX SILICA FILM

PURPOSE: A method for fabricating an ultralow refractive silica film is provided to obtain the uniform and homogenized silica film having high porosity using simple spin coating and to prevent the formation of cracks or porous channels. CONSTITUTION: A method for fabricating an ultralow refractive s...

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Bibliographische Detailangaben
Hauptverfasser: LEE, JUNE KEE, JEONG, HYUN DAM, MAI XUAN DUNG
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:PURPOSE: A method for fabricating an ultralow refractive silica film is provided to obtain the uniform and homogenized silica film having high porosity using simple spin coating and to prevent the formation of cracks or porous channels. CONSTITUTION: A method for fabricating an ultralow refractive silica film comprises the steps of: preparing styrene-based copolymerization nanoparticles by polymerizing a styrene monomer and a hydrophilic monomer having a hydrophilic functional group through an emulsion polymerization method; applying an aqueous dispersion of the styrene-based copolymerization nanoparticles to a substrate surface-modified to be hydrophilic using spin-coating and applying ultrasonic waves to the coated film in order to form a porous polymer film on which the styrene-based copolymerization nanoparticles is laminated; applying and deopositing a precursor solution including a silica precursor in the porous polymer film to form the composite film of a polymer-silica precursor; and heating the composite film and removing the porous polymer film to prepare the porous silica film.