THE COMPONENTS OF COSMETICS WITH POSITIVE AND THE METHOD OF MANUFACTURING THE COMPONENTS

PURPOSE: A cosmetic composition with plus zeta potential is provided to ensure excellent absorption of sweat and sebum and to improve makeup persistence. CONSTITUTION: A cosmetic composition containing a cosmetic material with plus zeta potential contains a cosmetic material having plus zeta potenti...

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Bibliographische Detailangaben
Hauptverfasser: SON, YOUNG MIN, CHO, HYUN DAE, PACK, SUN KI, KUM, JONG PIL, KIM, JAE YONG
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A cosmetic composition with plus zeta potential is provided to ensure excellent absorption of sweat and sebum and to improve makeup persistence. CONSTITUTION: A cosmetic composition containing a cosmetic material with plus zeta potential contains a cosmetic material having plus zeta potential containing: a mixture containing 0.01-99.00% of purified water/cornstarch/polyquarternium-10/antiseptic; a mixture containing 0.01-99.00% of purified water/cornstarch/polyquarternium-10/hydrogenated polydecene/caprylic glycol/antiseptic; a mixture containing 0.01-99.00% of talc/cornstarch/polyquarternium-10; or a mixture containing 0.01-30.00% of hydrogenated polyisobutene/hydrogenated polydecene/hydrogenated C6-14 olefin polymer. The cosmetic composition is manufactured in the form of foundation, powder, and mascara.