METHOD OF GENERATING MASK PATTERN, MASK PATTERN GENERATING PROGRAM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PURPOSE: A mask pattern generating method, mask pattern generating program, and semiconductor device manufacturing method are provided to prevent the taper shape of the section of a core pattern or a transfer pattern, thereby increasing the yield of a semiconductor device. CONSTITUTION: A controller...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOTANI TOSHIYA, ABURADA RYOTA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE: A mask pattern generating method, mask pattern generating program, and semiconductor device manufacturing method are provided to prevent the taper shape of the section of a core pattern or a transfer pattern, thereby increasing the yield of a semiconductor device. CONSTITUTION: A controller(10) comprises a CPU(Central Processing Unit)(100), a RAM(Random Access Memory)(101), and a ROM(Read Only Memory)(102). An input unit(12) comprises an input terminal such as a USB(Universal Serial Bus) terminal. An output unit(14) outputs mask pattern data(23). A display unit(18) displays a result calculated by the CPU. A memory unit(20) memorizes layout data(201).