RESIN COMPOSITION FOR COLOR FILTER, AND COLOR FILTER PRODUCED BY USING SAME

PURPOSE: A photoresist resin composition for a color filter and the color filter using thereof are provided to prevent the color mixing phenomenon of ink among pixels, and to secure the excellent development property of the color filter. CONSTITUTION: A photoresist resin composition for a color filt...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, KWANG SEOP, HWANG, HAN CHUL, LEE, IN JAE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE: A photoresist resin composition for a color filter and the color filter using thereof are provided to prevent the color mixing phenomenon of ink among pixels, and to secure the excellent development property of the color filter. CONSTITUTION: A photoresist resin composition for a color filter contains the following: an acryl resin containing fluorine with reoccurring units marked with chemical formula 1a, 1b, 1c, and 1d, and an unsaturated double bonding group; a cardo system resin; a reactive unsaturated compound; a photopolymerization initiator; a black pigment; and a solvent.