MASKLESS EXPOSURE APPARATUS AND CONTROL METHOD THEREOF

PURPOSE: A maskless exposure apparatus and control method thereof are provided to expose a substrate to enlarged or reduced light in the scan direction of the substrate, thereby preventing a pattern whose size is different from the size of a light exposure target pattern from being exposed to light....

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SUNG, JEONG HYOUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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