MASKLESS EXPOSURE APPARATUS AND CONTROL METHOD THEREOF
PURPOSE: A maskless exposure apparatus and control method thereof are provided to expose a substrate to enlarged or reduced light in the scan direction of the substrate, thereby preventing a pattern whose size is different from the size of a light exposure target pattern from being exposed to light....
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | PURPOSE: A maskless exposure apparatus and control method thereof are provided to expose a substrate to enlarged or reduced light in the scan direction of the substrate, thereby preventing a pattern whose size is different from the size of a light exposure target pattern from being exposed to light. CONSTITUTION: A spatial light modulating unit(130) selectively transfers light onto a substrate. A driving pulse generating unit(170) generates a driving pulse signal which adjusts the operating timing of the spatial light modulating unit. A substrate shape measuring unit(150) measures the length of the substrate. A driving pulse correcting unit(160) compensates for a cycle at which a driving pulse signal is generated. |
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