ALIGN SYSTEM AND METHOD OF STAGE, AND A PATTERN FORMING APPARATUS HAVING THE SAME

PURPOSE: A system and method for aligning a stage and a pattern forming device including the same are provided to improve print quality by reducing vibration due to the dual axial alignment of a stage. CONSTITUTION: An align system of a stage includes a base member, a first axis align device(280a) a...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, YEON JUNG, SEO, TAI HEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A system and method for aligning a stage and a pattern forming device including the same are provided to improve print quality by reducing vibration due to the dual axial alignment of a stage. CONSTITUTION: An align system of a stage includes a base member, a first axis align device(280a) and a Θ axis align device(280b). The first axis align device is formed on the base member and aligns the stage in a first axis direction. The Θ axis align device is provided between the first axis align device and the stage and aligns the stage in the Θ axis direction. The vertical stage alignment to the first axis direction is implemented by the rotation of a rotary axis of a blanket roll(240) or translation of the blanket roll.