ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME

PURPOSE: An array substrate and a method for fabricating the same are provided to improve the TFT property by preventing the exposure of the TFT to a dry etchant. CONSTITUTION: An array substrate comprises a gate electrode(107) formed on a switching area as an island type, a gate insulating layer(11...

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Bibliographische Detailangaben
Hauptverfasser:	SEO, SEONG MOH, CHOI, HEE DONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE: An array substrate and a method for fabricating the same are provided to improve the TFT property by preventing the exposure of the TFT to a dry etchant. CONSTITUTION: An array substrate comprises a gate electrode(107) formed on a switching area as an island type, a gate insulating layer(110) formed on the gate electrode with the same plane shape with the gate electrode, an active layer(115) which exposes edge part of the gate insulating layer, an inter-layer insulating film(122) including a first contact hole(124) which exposes the gate insulating layer, and a source and drain electrode formed on an ohmic contact layer.