METHOD FOR MANUFACTURING CYLINDER TYPE CAPACITOR

METHOD FOR MANUFACTURING CYLINDER TYPE CAPACITOR

PURPOSE: A capacitor manufacturing method of cylinder structure is provided to prevent the loss of the bottom of a storage node during the etching process of a following support layer by forming a capping layer using the amorphose carbon layer. CONSTITUTION: An etch stopping layer(22) and a support...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LEE, SANG DO, LEE, KEE JUNE
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: A capacitor manufacturing method of cylinder structure is provided to prevent the loss of the bottom of a storage node during the etching process of a following support layer by forming a capping layer using the amorphose carbon layer. CONSTITUTION: An etch stopping layer(22) and a support membrane(24) are made of the nitride film. An isolation insulating layer(23) and a protective film are made of the oxide film. The support membrane implements the role of preventing the leaning phenomenon during the following wet dip out process. The storage node conductive layer is made of the metallic layer.