MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE
PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A s...
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| creator | BOK, CHEOL KYU |
| description | PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A second photosensitive pattern(45) of a line and space type is formed in a vertical direction to a first photosensitive pattern(35). A third photosensitive pattern(55) of a line and space type is parallel to the first photosensitive pattern. The third photosensitive pattern of the line and space type is positioned in a space between the first photosensitive patterns. A fourth photosensitive pattern of the line and space type is parallel to the second photosensitive pattern. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20110001693A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20110001693A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20110001693A3</originalsourceid><addsrcrecordid>eNrjZCj0dQz2VnDzDwJhX08_dwVnf78QR-cQBQ9_H1cFfzeFYFdfT6CYS6hzCFCVi2uYp7OrgqOfi4Kva4iHvwvJenkYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSbx3kJGBoaGBgYGhmaWxozFxqgCwHTiE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE</title><source>esp@cenet</source><creator>BOK, CHEOL KYU</creator><creatorcontrib>BOK, CHEOL KYU</creatorcontrib><description>PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A second photosensitive pattern(45) of a line and space type is formed in a vertical direction to a first photosensitive pattern(35). A third photosensitive pattern(55) of a line and space type is parallel to the first photosensitive pattern. The third photosensitive pattern of the line and space type is positioned in a space between the first photosensitive patterns. A fourth photosensitive pattern of the line and space type is parallel to the second photosensitive pattern.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110106&DB=EPODOC&CC=KR&NR=20110001693A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110106&DB=EPODOC&CC=KR&NR=20110001693A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BOK, CHEOL KYU</creatorcontrib><title>MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE</title><description>PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A second photosensitive pattern(45) of a line and space type is formed in a vertical direction to a first photosensitive pattern(35). A third photosensitive pattern(55) of a line and space type is parallel to the first photosensitive pattern. The third photosensitive pattern of the line and space type is positioned in a space between the first photosensitive patterns. A fourth photosensitive pattern of the line and space type is parallel to the second photosensitive pattern.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCj0dQz2VnDzDwJhX08_dwVnf78QR-cQBQ9_H1cFfzeFYFdfT6CYS6hzCFCVi2uYp7OrgqOfi4Kva4iHvwvJenkYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSbx3kJGBoaGBgYGhmaWxozFxqgCwHTiE</recordid><startdate>20110106</startdate><enddate>20110106</enddate><creator>BOK, CHEOL KYU</creator><scope>EVB</scope></search><sort><creationdate>20110106</creationdate><title>MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE</title><author>BOK, CHEOL KYU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20110001693A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2011</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>BOK, CHEOL KYU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BOK, CHEOL KYU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE</title><date>2011-01-06</date><risdate>2011</risdate><abstract>PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A second photosensitive pattern(45) of a line and space type is formed in a vertical direction to a first photosensitive pattern(35). A third photosensitive pattern(55) of a line and space type is parallel to the first photosensitive pattern. The third photosensitive pattern of the line and space type is positioned in a space between the first photosensitive patterns. A fourth photosensitive pattern of the line and space type is parallel to the second photosensitive pattern.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE |
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