MASK FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE AND METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE

PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A s...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	BOK, CHEOL KYU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE: A method for forming a contact hole and a mask for forming the contact hole of a semiconductor device are provided to increase the yield of a semiconductor device by improving the uniformity of a contact hole pattern and reducing the diameter and pitch of the contact hole. CONSTITUTION: A second photosensitive pattern(45) of a line and space type is formed in a vertical direction to a first photosensitive pattern(35). A third photosensitive pattern(55) of a line and space type is parallel to the first photosensitive pattern. The third photosensitive pattern of the line and space type is positioned in a space between the first photosensitive patterns. A fourth photosensitive pattern of the line and space type is parallel to the second photosensitive pattern.