DEVELOPING PROCESSING APPARATUS

PURPOSE: A development processing apparatus is provided to reduce particles on the rear side of a substrate by eliminating air bubbles which are attached on the rear side of the substrate. CONSTITUTION: A rotary base(2) horizontally supports a substrate. A rotary driving unit(17) rotates the rotary...

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Bibliographische Detailangaben
1. Verfasser:	FUNAKOSHI HIDEO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A development processing apparatus is provided to reduce particles on the rear side of a substrate by eliminating air bubbles which are attached on the rear side of the substrate. CONSTITUTION: A rotary base(2) horizontally supports a substrate. A rotary driving unit(17) rotates the rotary base. An external circumferential plate surrounding the external circumferential part of the substrate rotates with the rotary driving unit. An elevation driving unit(4A) elevates a plurality of supporting pins. The supporting pins transfer the substrate. A controlling unit controls the rotary driving unit and the elevation driving unit.