TEXTURING AND CLEANING AGENT FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF

TEXTURING AND CLEANING AGENT FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF

A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusive...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MAYER KUNO, ROSTAS ARPAD MIHAI, ZIMMER MARTIN, SCHUMANN MARK, ZIMMER EVA, KIRCHGASSNER ELIAS, ORELLANA PERES TERESA, RENTSCH JOCHEN, BIRO DANIEL, KRAY DANIEL
Format: Patent
Sprache:eng ; kor
Schlagworte:
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.