METHOD FOR DEFECT DETECTING MASK OF SURFACE TREATMENT FOR EACH OTHER DIFFERENT LEVEL

PURPOSE: A method for detecting defects on a mask which includes a treated surface for obtaining different interfaces is provided to improve detection precision by overcoming the sensing limit for detecting the defects. CONSTITUTION: A monitoring region is defined on a mask(S100). A surface treatmen...

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Bibliographische Detailangaben
Hauptverfasser:	BANG, KYOUNG YOON, RO, JEONG HUN, PARK, JIN BACK, CHO, SUNG YONG, JUNG, JIN SIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PURPOSE: A method for detecting defects on a mask which includes a treated surface for obtaining different interfaces is provided to improve detection precision by overcoming the sensing limit for detecting the defects. CONSTITUTION: A monitoring region is defined on a mask(S100). A surface treatment is performed to the monitoring region(S200). Exposure energy is supplied to the surface treated mask(S300). An optical detector is arranged on the exposed mask(S400). The spectrum change of the exposed mask is measured(S500).