LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, BADAM VIJAY KUMAR, DE GROOT CASPER RODERIK, JACOBS JOHANNES HENRICUS WILHELMUS, VAN DER HOEVEN JAN CORNELIS, BRANDS GERT JAN GERARDUS JOHANNES THOMAS, STAVENGA MARCO KOERT, KAMPHUIS MARTIJN HENDRIK, ANSTOTZ DAVID LUCIEN, KNAAPEN THIJS EGIDIUS JOHANNES, PELLENS RUDY JAN MARIA, BRULS RICHARD JOSEPH, VAN DER ZANDEN MARCUS JOHANNES, VERSPAGET COEN CORNELIS WILHELMUS, MAAS RUDOLF ADRIANUS JOANNES
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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