LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid...
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Format: | Patent |
Sprache: | eng ; kor |
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Zusammenfassung: | PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid to a space adjacent to the substrate and/or the table. A liquid displacing device(20) displaces the liquid from the sensor and/or the target. The liquid displacing device comprises a gas knife device(21) which is connected to a fluid limited structure through an actuator(22). A gas exhausting pipe is composed in order to make the local gas flow to the sensor and/or the target. |
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