LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid...

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Hauptverfasser: LIEBREGTS PAULUS MARTINUS MARIA, VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, BADAM VIJAY KUMAR, DE GROOT CASPER RODERIK, JACOBS JOHANNES HENRICUS WILHELMUS, VAN DER HOEVEN JAN CORNELIS, BRANDS GERT JAN GERARDUS JOHANNES THOMAS, STAVENGA MARCO KOERT, KAMPHUIS MARTIJN HENDRIK, ANSTOTZ DAVID LUCIEN, KNAAPEN THIJS EGIDIUS JOHANNES, PELLENS RUDY JAN MARIA, BRULS RICHARD JOSEPH, VAN DER ZANDEN MARCUS JOHANNES, VERSPAGET COEN CORNELIS WILHELMUS, MAAS RUDOLF ADRIANUS JOANNES
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A lithography device and a device manufacturing thereof are provided to displace liquid from a target and/or a sensor using a local gas flow. CONSTITUTION: A table is composed to support a substrate(W) or a sensor or both a substrate and a sensor. A liquid handing structure provides liquid to a space adjacent to the substrate and/or the table. A liquid displacing device(20) displaces the liquid from the sensor and/or the target. The liquid displacing device comprises a gas knife device(21) which is connected to a fluid limited structure through an actuator(22). A gas exhausting pipe is composed in order to make the local gas flow to the sensor and/or the target.