APPARATUS FOR MANAGING GAS CYLINDER CHARGE AND SUPPLYING GAS FOR SEMICONDUCTOR

PURPOSE: A gas cylinder charge processing for a semiconductor and a gas supply apparatus are provided to smoothly supply the gas by maintaining a temperature of the gas filled in the cylinder through a control of a heat source. CONSTITUTION: A main body(21) has a storage space inside. A cylinder acc...

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Bibliographische Detailangaben
1. Verfasser:	KONG, SUNG HEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	PURPOSE: A gas cylinder charge processing for a semiconductor and a gas supply apparatus are provided to smoothly supply the gas by maintaining a temperature of the gas filled in the cylinder through a control of a heat source. CONSTITUTION: A main body(21) has a storage space inside. A cylinder accepting part(20) accepts a cylinder between the main body and a cover(22). A heating source(30) makes phase change a moisture remaining the cylinder into a condition. A vacuum pump releases a gas inside of the cylinder to the outside. A controller controls the heating source for maintaining a constant temperature range with the cylinder. Heaters(21a,22a) are formed the main body inside of the cylinder accepting part and inside of a cover.