CLEANING COMPOSITION

PURPOSE: A cleaning composition is provided to effectively separate and remove contaminants existing in a wet apparatus in a form of slime without a physical power, and to minimize the generation of a secondary contamination. CONSTITUTION: A cleaning composition without a sulfamic acid compound cont...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, BYOUNG MOOK, BANG, SOON HONG, YOON, HYO JOONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	PURPOSE: A cleaning composition is provided to effectively separate and remove contaminants existing in a wet apparatus in a form of slime without a physical power, and to minimize the generation of a secondary contamination. CONSTITUTION: A cleaning composition without a sulfamic acid compound contains 1~20wt% of chlorine-based oxidizer, 1~10wt% of basic compound, and water. The chlorine-based oxidizer is formed with more than one compound selected from the group consisting of chlorine, hypochlorous acid alkali metal salt, hypochlorous acid alkali earth metal salt, alkali metalchlorite, chlorite alkali earth metal salt, hydrochloric acid alkali metal salt, hydrochloric acid alkali earth metal salt and chlorite nickel. The pH of the cleaning composition is 8~14.