CONFINING MAGNETS IN SPUTTERING CHAMBER

CONFINING MAGNETS IN SPUTTERING CHAMBER

PURPOSE: A confining magnets in sputtering chamber is provided to coat a side of a via better by inclining two targets in an opposing angle. CONSTITUTION: A chamber(30) comprises at least one product support region(42) for accepting a product. The chamber can be sealed in order to create a low-press...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MULLAPUDI RAVI, NINAN BIJU
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: A confining magnets in sputtering chamber is provided to coat a side of a via better by inclining two targets in an opposing angle. CONSTITUTION: A chamber(30) comprises at least one product support region(42) for accepting a product. The chamber can be sealed in order to create a low-pressure environment. A target(40) locates within the chamber. A magnet(44) faces with the rear end of the target. A magnetic wall within the chamber is extended over the target towards the product support region.