RESIST PROTECTIVE FILM COMPOSITION FOR IMMERSION LITHOGRAPHY

Disclosed is a resist protective film composition for immersion lithography. Specifically disclosed is a resist protective film composition for immersion lithography, which contains an alkali-soluble polymer (B) containing a repeating unit (U) which is formed by polymerization of a polymerizable com...

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Bibliographische Detailangaben
Hauptverfasser:	YOKOKOJI OSAMU, TAKEBE YOKO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP
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Beschreibung
Zusammenfassung:	Disclosed is a resist protective film composition for immersion lithography. Specifically disclosed is a resist protective film composition for immersion lithography, which contains an alkali-soluble polymer (B) containing a repeating unit (U) which is formed by polymerization of a polymerizable compound (m) having a hydroxy group, a carboxy group, a sulfonic acid group, a sulfonylamide group, an amino group or a phosphoric acid group, and a fluorine-containing polymer (F) containing the repeating unit (U) and a repeating unit (U) which is formed by polymerization of a polymerizable compound (m) having a fluorine-containing hydrocarbon group with 2-20 carbon atoms (wherein-O-,-C(O)-or-C(O)O-may be inserted between two carbon atoms).