METHOD OF TEXTURING SEMICONDUCTOR SUBSTRATE FOR SOLAR CELL USING DRY ETCHING

PURPOSE: A method of texturing a semiconductor substrate for a solar cell using dry etching are provided to improve texturing and the efficiency of the solar cell by adding a chemical such as IPA including carbon to a dry etch gas and etching the surface of the semiconductor. CONSTITUTION: A mask is formed in a part of the surface of a semiconductor substrate(S100). The etching gas of a plasma state is supplied to the semiconductor substrate and the substrate is dry-etched(S200). A processing chamber in which the semiconductor substrate puts is pressurized(S210). A mixed etching gas with a chemical containing SF6 gas, oxygen(O2) gas, and carbon component is supplied to the substrate in order to etch the semiconductor substrate(S220). An RF(Radio Frequency) power making the etching gas plasma state is applied to the substrate(S230). A carbon component masking and etching process is performed(S240).