JIG FOR SUBSTRATE-TREATING APPARATUS AND MAINTENANCE METHOD USING THE SAME

PURPOSE: A jig for a substrate-treating apparatus and a maintenance method using the same are provided to maintain the interval of a gas distributing plate and a substrate uniform by easily placing the center of gas distributing plate to a diffuser cover. CONSTITUTION: A first jig(110) includes a pl...

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Bibliographische Detailangaben
Hauptverfasser:	KANG, HO CHUL, HUR, SUNG MIN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A jig for a substrate-treating apparatus and a maintenance method using the same are provided to maintain the interval of a gas distributing plate and a substrate uniform by easily placing the center of gas distributing plate to a diffuser cover. CONSTITUTION: A first jig(110) includes a plurality of vertical parts. A second jig(120) is ascended to the height of a plurality of vertical part. The chamber cover(104) including a diffuser cover therein is arranged in a first jig. The second jig including a first gas distribution plate(132) is received into the first jig. A first gas distribution plate and the second jig are ascended to the height of a plurality of vertical part. The ascended first gas distribution plate is combined with the diffuser cover.