RADIATION SENSITIVE RESIN COMPOSITION, SPACER FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FORMING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE

PURPOSE: A radiation-sensitive resin composition is provided to obtain an enough spacer form with an exposure dose of 1,000 J/m^2 or less, and to ensure elastic recoverability, rubbing resistance, adhesion with a transparent substrate and heat resistance. CONSTITUTION: A radiation-sensitive resin co...

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Hauptverfasser:	ICHINOHE DAIGO, KAJITA TOORU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE: A radiation-sensitive resin composition is provided to obtain an enough spacer form with an exposure dose of 1,000 J/m^2 or less, and to ensure elastic recoverability, rubbing resistance, adhesion with a transparent substrate and heat resistance. CONSTITUTION: A radiation-sensitive resin composition comprises (A) a copolymer of (a1) at least one kind selected from the group consisting of unsaturated carboxylic acid and unsaturated carboxylic anhydride and (a2) unsaturated compounds excluding (a1), (B) a polymerizable unsaturated compound, and (C) a compound represented by chemical formula 1.