STACKED LOAD LOCK CHAMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
PURPOSE: A stacked load lock chamber and a substrate processing apparatus including the same are provided to protect a substrate while loading and unloading of the substrate from the particle in air. CONSTITUTION: A stack load lock chamber(2) comprises a first and a second load lock chambers(100,150...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE: A stacked load lock chamber and a substrate processing apparatus including the same are provided to protect a substrate while loading and unloading of the substrate from the particle in air. CONSTITUTION: A stack load lock chamber(2) comprises a first and a second load lock chambers(100,150) and a first and second slit-valve transfer(101,151). The first and second load lock chambers are successively laminated inside a stack load lock chamber. The first slit - valve transfer opens and closes a first opening of the first load lock chamber. A second slit - valve transfer opens and closes the second aperture of the second rod lock chamber. The stack load lock chamber more includes a first and second arms and an actuator. |
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