EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICE ANALYZED LAYERED MEDIA DIMENSION AND USED THE SAME

PURPOSE: An equipment for manufacturing a semiconductor device analyzed layered media dimension and used the same are provided to calculate a complex three-dimensional pattern by obtaining a profile corresponding to a solution of a function. CONSTITUTION: A semiconductor substrate to be processed through a semiconductor manufacturing process(S10). A reference spectrum and reference profile from a substrate which is determined as a reference substrate is detected(S20). A function related to the function of the reference spectrum and reference profile is extracted(S30). A real-time spectrum of the fixed substrate is detected from the substrates. The profile of the substrate to be processed in a semiconductor manufacturing process is detected in real time by applying a real-time spectrum valuable to the function(S40).