CURABLE COMPOSITION FOR NANOIMPRINT AND PATTERNING METHOD

PURPOSE: A curing composition for nanoimprint, and a method for forming a resist pattern by using the composition are provided to form a micropattern, to improve the adhesion to a substrate after photocuring process and the release of a resist. CONSTITUTION: A curing composition for nanoimprint comp...

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Bibliographische Detailangaben
Hauptverfasser:	FUJITA AKINORI, TAKAYANAGI TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PURPOSE: A curing composition for nanoimprint, and a method for forming a resist pattern by using the composition are provided to form a micropattern, to improve the adhesion to a substrate after photocuring process and the release of a resist. CONSTITUTION: A curing composition for nanoimprint comprises 87 mass % or more of a monofunctional polymerizable compound, and a photopolymerization initiator. A method for forming a resist pattern comprises the steps of coating the curing composition for nanoimprint; pressing a light permeable mold on the resist layer on a substrate to modify the curing composition for nanoimprint; and irradiating light from the backside of the mold or the substrate to cure the coat, and fitting it to the desired pattern.