THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN AND ANTI-REFLECTIVE COATING

PURPOSE: A thinner composition for removing a photosensitive resin and a bottom antireflective coating is provided to obtain excellent solubility and EBR property and to improve the coating property of photoresist. CONSTITUTION: A thinner composition for removing a photosensitive resin and a bottom...

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Bibliographische Detailangaben
Hauptverfasser:	OH, YOUNG NAM, LEE, KYONG HO, KWUN, GI JIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE: A thinner composition for removing a photosensitive resin and a bottom antireflective coating is provided to obtain excellent solubility and EBR property and to improve the coating property of photoresist. CONSTITUTION: A thinner composition for removing a photosensitive resin and a bottom antireflective coating comprises 30 ~ 90 wt% of at least one selected from the group consisting of ethyl-3-ethoxypropionate (EEP), methyl-3-methoxypropionate (MMP) and their mixture; 1 ~ 20 wt% of ethyl lactate (EL); and 5 ~ 50 wt% of cyclohexanone (CHN). The thinner composition comprises further a surfactant. The surfactant is a fluorine-based surfactant, a nonionic surfactant or an ionic surfactant.