METHOD FOR PATTERNING THIN FILM BY LASER PRINTING

PURPOSE: A thin film patterning method is provided to form a nano particle thin film simply without a complex photoresist by selectively removing a particle in the thin film using the pulse laser. CONSTITUTION: A light transmissive source substrate(40) with a thin film(50) including the particle is...

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Bibliographische Detailangaben
Hauptverfasser:	SHIN, HYUN KWON, LEE, MYEONG KYU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A thin film patterning method is provided to form a nano particle thin film simply without a complex photoresist by selectively removing a particle in the thin film using the pulse laser. CONSTITUTION: A light transmissive source substrate(40) with a thin film(50) including the particle is provided. A receiver substrate(60) is arranged to face the surface of the source substrate with the thin film. A pulse laser beam emitted from a pulse laser beam irradiation unit passes through a spatial light modulator(20) and is irradiated to the source substrate. A parallel patterning process is performed in the source substrate to form the pattern corresponding to the pattern of the spatial light modulator in the particle thin film. A thin film(70) with the pattern corresponding to the pattern formed in the source substrate is formed on the receiver substrate.