COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE

COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE

A composition for polishing surfaces, the composition comprising the following components: a) at least one inorganic abrasive component (S), comprising a lanthanide oxide, b) at least one organic dispersant component made of polymer (P), c) at least one organic gelling agent (G), such as gellan gum,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KERN GUENTER, DEBUS HEIDRUN, BEHRENS SVEN HOLGER, LIU YAQIAN
Format: Patent
Sprache:eng
Schlagworte:
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
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Beschreibung
Zusammenfassung:A composition for polishing surfaces, the composition comprising the following components: a) at least one inorganic abrasive component (S), comprising a lanthanide oxide, b) at least one organic dispersant component made of polymer (P), c) at least one organic gelling agent (G), such as gellan gum, d) water as the solvent or dispersing medium, and e) optionally further adjuvants and additives, has high stability.