GAS TREATMENT APPARATUS, GAS TREATMENT METHOD AND STORAGE MEDIUM

GAS TREATMENT APPARATUS, GAS TREATMENT METHOD AND STORAGE MEDIUM

A gas treatment apparatus is provided with a chamber (40) for storing a wafer (W); a transfer mechanism (17) for transferring works to be treated to the chamber (40) one by one; a gas supply mechanism for supplying the chamber (40) with an adsorptive gas for performing gas treatment to the wafer (W)...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MURAKI YUSUKE, TOZAWA SHIGEKI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A gas treatment apparatus is provided with a chamber (40) for storing a wafer (W); a transfer mechanism (17) for transferring works to be treated to the chamber (40) one by one; a gas supply mechanism for supplying the chamber (40) with an adsorptive gas for performing gas treatment to the wafer (W); and a control section (90) for introducing the treatment gas into the chamber prior to carrying the first work into the chamber, and controlling the gas supply mechanism and the transfer mechanism to carry the first work into the chamber after a prescribed time.