POLISHING PAD AND ITS MANUFACTURING PROCESS

PURPOSE: A polishing pad and a manufacturing method thereof are provided to facilitate manufacture and shorten polishing time and improve polishing efficiency. CONSTITUTION: A polishing pad comprises a base(20), a first groove, and a second groove. The first groove(30) is repeatedly formed on the su...

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Bibliographische Detailangaben
1. Verfasser:	MOON, DEOG JU
Format:	Patent
Sprache:	eng
Schlagworte:	GRINDING PERFORMING OPERATIONS POLISHING TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	PURPOSE: A polishing pad and a manufacturing method thereof are provided to facilitate manufacture and shorten polishing time and improve polishing efficiency. CONSTITUTION: A polishing pad comprises a base(20), a first groove, and a second groove. The first groove(30) is repeatedly formed on the surface of the base with the wave pattern of the identical cycle. The second groove(40) is repeatedly formed on the surface of the base with the wave pattern of the identical cycle to intersect with the first groove. The first and second grooves are repeatedly formed at constant intervals. The outer wall of a plurality of grinding projection parts(50) formed by the intersection of the first and second grooves is formed at the angle of 45~90° to the base. The upper part of the outer wall has the same structure.