METHOD FOR MAINTAINING STATISTICAL PROCESS USED SEMICONDUCTOR MANUFACTURE EQUIPMENT CONTROL SYSTEM

A method for maintaining a statistical process used for a semiconductor manufacture equipment control system are provided to increase the reliability of a process management and maximize it by update a management limit time through QB statistical volume in real time. In a method for maintaining a statistical process used for a semiconductor manufacture equipment control system, measurement data corresponded to the property of a wafer from more than one measurement apparatus are collected(S10). The general statistics amount corresponding to a mean value and a distribution value of measurement data is calculated(S20). The distribution in a group is corresponded to the measurement data detected from a plurality of wafers. Measurement data are detected from a target wafer based on the several cassettes in which a plurality of wafers is mounted.