INFRARED SENSOR AND MANUFACTURING METHOD THEREOF
An infrared sensor and a manufacturing method thereof are provided to prevent a problem generated in removing a sacrificial layer from a heat-sensitive device in advance by making reaction of a heat-sensitive resistor rapid according to temperature of a substrate. A first device(1a) is formed on a s...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!