APPRATUS OF MANUFACTURING SEMICONDUCTOR DEVICE CAPABLE OF PROVENTING ARCING TO BE GENERATED AT THE WAFER EDGE

An apparatus for manufacturing a semiconductor device is provided to prevent a charge accumulated in a wafer edge among an etching process from being transmitted to a focus ring by coating the nonconductive material on the focus ring. An apparatus for manufacturing a semiconductor device includes a chamber(200), a focus ring(20), and a nonconductive material(22). The chamber has a sealing space to etch a wafer. The focus ring is installed inside the chamber. The nonconductive material is coated on the focus ring. The focus ring delays the transmission speed of the charge accumulated in the wafer edge to the focus ring in an etching process.