METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS

METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS

A method of measuring focus of a lithographie projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predeter...

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Bibliographische Detailangaben
Hauptverfasser: GERAETS HUBERTUS ANTONIUS, MAGNUSSON SVEN GUNNAR KRISTER, ZELLENRATH MARK, HOFMANS GERARDUS CAROLUS JOHANNUS
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method of measuring focus of a lithographie projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset FO. After developing, an alignment offset for each of the verification markers is measured and translated into defocus data using a transposed focal curve. The method according to the invention results in a focus-versus alignment shift sensitivity some 50 times higher (typically dX,Y/dZ = 20) than the present LVT.